Nano-Imprint Templates
Working in conjunction with our mastering partners, Holographix produces replicated nano-imprint templates from patterned quartz or silicon masters providing cost-effective tools for the imprint lithography industry for fabrication of nano-structures.
Nano-Imprint Template Process
Why Replicated Templates?
Why risk your high-value quartz or silicon master when Holographix can produce 10s or 100s of replicated imprint templates directly from your master for use in your imprint lithography application.
Holographix has the ability create imprint templates from almost any original media. A surface relief pattern is all that is required!
Media we work with include:
- E-beam written reactive ion etched silicon masters
- E-beam written reactive ion etched quartz masters
- Photoresist masters
- Nickel stampers
- PDMS molds
Benefits include:
- No release agents required on master
- Reduced risk to initial master investment
- Repeatable, high-fidelity reproduction of master pattern
- Template reproduction provides higher repeatability compared to master reproduction
- Ability to create <50nm features sizes with aspect ratios >4:1
- Ability to maintain Mesa structures throughout process
- Exceptional durability and solvent resistance
Micro-Fluidic Well |
Diffractive Array |
Textured Micro Wells |
Template Characteristics:
| Specifications | Capabilities |
|---|---|
| Feature resolution: | >10 nanometers |
| Temperature range: | -50° C to 200° C |
| Humidity range: | 0 to 95% continuous |
| Chemical resistance: | impervious to degradation by solvent, acid, and alkaline environments |
Contact
For any questions regarding our nano-imprint capabilities, please fill out the contact form below.