Working in conjunction with our worldwide imprint template distributor, Benchmark Technologies, Holographix produces replicated nano-imprint templates from patterned quartz or silicon masters providing cost-effective tools for the imprint lithography industry for fabrication of nano-structures.
We offer:
- High quality 2nd or 3rd generation imprint templates from original master patterns.
- Feature resolution of less than 10 nm
- A variety of substrate materials and form factors
- Solutions for UV NIL, hot embossing, and electroforming applications
Template characteristics:
| Feature resolution: | <10 nanometers |
| Temperature range: | -50° C to 200° C |
| Humidity range: | 0 to 95% continuous |
| Chemical resistance: | impervious to degradation by solvent, acid, and alkaline environments |